@inproceedings{0be8ceec52a3410db8f4ad5ef167c062,
title = "A nanochannel fabrication technique using chemical-mechanical polishing (CMP) and thermal oxidation",
abstract = "We have developed a new nanochannel fabrication technique using chemical-mechanical polishing (CMP) and thermal oxidation. With this technique, it is possible to control the width, length, and depth of the nanochannels without the need for nanolithography. The use of sacrificial SiO2 layers allows the fabrication of centimeter-long nanochannels. In addition, the fabrication process is CMOS compatible. We have successfully fabricated an array of extremely long and narrow nanochannels (i.e. 10 mm long, 25 nm wide and 100 nm deep) with smooth inner surfaces.",
keywords = "Amorphous silicon, CMOS process, Chemical technology, Etching, Lithography, Machining, Optical device fabrication, Oxidation, Semiconductor films, Thickness control",
author = "Choonsup Lee and Yang, {E. H.} and Myung, {N. V.} and T. George",
note = "Publisher Copyright: {\textcopyright} 2003 IEEE.; 2003 3rd IEEE Conference on Nanotechnology, IEEE-NANO 2003 ; Conference date: 12-08-2003 Through 14-08-2003",
year = "2003",
doi = "10.1109/NANO.2003.1230970",
language = "English",
series = "Proceedings of the IEEE Conference on Nanotechnology",
pages = "553--556",
booktitle = "2003 3rd IEEE Conference on Nanotechnology, IEEE-NANO 2003 - Proceedings",
}