Original language | English |
---|---|
Pages (from-to) | 1341-1343 |
Number of pages | 3 |
Journal | Journal of Materials Science Letters |
Volume | 8 |
Issue number | 11 |
DOIs | |
State | Published - Nov 1989 |
Annealing studies of coupled Si3N4 and SiO2 films
H. Du, R. E. Tressler, K. E. Spear, M. Wang
Research output: Contribution to journal › Article › peer-review
9
Scopus
citations