Annealing studies of coupled Si3N4 and SiO2 films

H. Du, R. E. Tressler, K. E. Spear, M. Wang

Research output: Contribution to journalArticlepeer-review

9 Scopus citations
Original languageEnglish
Pages (from-to)1341-1343
Number of pages3
JournalJournal of Materials Science Letters
Volume8
Issue number11
DOIs
StatePublished - Nov 1989

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