Annealing studies of coupled Si3N4 and SiO2 films

Annealing studies of coupled Si₃N₄ and SiO₂ films

H. Du, R. E. Tressler, K. E. Spear, M. Wang

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Original language	English
Pages (from-to)	1341-1343
Number of pages	3
Journal	Journal of Materials Science Letters
Volume	8
Issue number	11
DOIs	https://doi.org/10.1007/BF00721515
State	Published - Nov 1989

TY - JOUR

T1 - Annealing studies of coupled Si3N4 and SiO2 films

AU - Du, H.

AU - Tressler, R. E.

AU - Spear, K. E.

AU - Wang, M.

PY - 1989/11

Y1 - 1989/11

UR - https://www.scopus.com/pages/publications/0024767856

UR - https://www.scopus.com/inward/citedby.url?scp=0024767856&partnerID=8YFLogxK

U2 - 10.1007/BF00721515

DO - 10.1007/BF00721515

M3 - Article

AN - SCOPUS:0024767856

SN - 0261-8028

VL - 8

SP - 1341

EP - 1343

JO - Journal of Materials Science Letters

JF - Journal of Materials Science Letters

IS - 11

ER -