Depth profiling of Hf-doped aluminide coating by glow-discharge mass spectrometry

L. M. He; K. Putyera; J. D. Meyer; L. R. Walker; W. Y. Lee

doi:10.1007/s11661-002-0348-2

Depth profiling of Hf-doped aluminide coating by glow-discharge mass spectrometry

L. M. He, K. Putyera, J. D. Meyer, L. R. Walker, W. Y. Lee

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Abstract

The advantages and limitations of the glow discharge mass spectroscopy (GDMS) technique as a depth-profiling technique were studied in terms of analyzing the concentration and distribution of Hf in the coating matrix and in comparison to traditional metallography and EPMA characterization. While the EMPA technique was superior to GDMS in terms of spatially resolving Hf concentrations above ∼0.2 wt pct, the EMPA technique was determined to be ineffective for quantitative analysis for concentrations below ∼0.15 wt pct. The GDMS depth profiling was able to determine Hf concentration and distribution characteristics in a relatively accurate manner for the concentration range considered.

Original language	English
Pages (from-to)	3578-3582
Number of pages	5
Journal	Metallurgical and Materials Transactions A: Physical Metallurgy and Materials Science
Volume	33
Issue number	11
DOIs	https://doi.org/10.1007/s11661-002-0348-2
State	Published - Nov 2002

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abstract = "The advantages and limitations of the glow discharge mass spectroscopy (GDMS) technique as a depth-profiling technique were studied in terms of analyzing the concentration and distribution of Hf in the coating matrix and in comparison to traditional metallography and EPMA characterization. While the EMPA technique was superior to GDMS in terms of spatially resolving Hf concentrations above ∼0.2 wt pct, the EMPA technique was determined to be ineffective for quantitative analysis for concentrations below ∼0.15 wt pct. The GDMS depth profiling was able to determine Hf concentration and distribution characteristics in a relatively accurate manner for the concentration range considered.",

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AU - He, L. M.

AU - Putyera, K.

AU - Meyer, J. D.

AU - Walker, L. R.

AU - Lee, W. Y.

PY - 2002/11

Y1 - 2002/11

N2 - The advantages and limitations of the glow discharge mass spectroscopy (GDMS) technique as a depth-profiling technique were studied in terms of analyzing the concentration and distribution of Hf in the coating matrix and in comparison to traditional metallography and EPMA characterization. While the EMPA technique was superior to GDMS in terms of spatially resolving Hf concentrations above ∼0.2 wt pct, the EMPA technique was determined to be ineffective for quantitative analysis for concentrations below ∼0.15 wt pct. The GDMS depth profiling was able to determine Hf concentration and distribution characteristics in a relatively accurate manner for the concentration range considered.

AB - The advantages and limitations of the glow discharge mass spectroscopy (GDMS) technique as a depth-profiling technique were studied in terms of analyzing the concentration and distribution of Hf in the coating matrix and in comparison to traditional metallography and EPMA characterization. While the EMPA technique was superior to GDMS in terms of spatially resolving Hf concentrations above ∼0.2 wt pct, the EMPA technique was determined to be ineffective for quantitative analysis for concentrations below ∼0.15 wt pct. The GDMS depth profiling was able to determine Hf concentration and distribution characteristics in a relatively accurate manner for the concentration range considered.

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JO - Metallurgical and Materials Transactions A: Physical Metallurgy and Materials Science

JF - Metallurgical and Materials Transactions A: Physical Metallurgy and Materials Science

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ER -

Depth profiling of Hf-doped aluminide coating by glow-discharge mass spectrometry

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