Design, fabrication, and applications of large-area well-ordered dense-array three-dimensional nanostructures

Chang Hwan Choi, Chang Jin Kim

Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review

Abstract

A highly effective fabrication process combining interference lithography with deep reactive ion etching is described. This simple technique makes it possible to build well-ordered dense-array of nanostructures with good control of pattern regularity and size over a large area. The unique three-dimensional structures possible with this process can have a variety of applications in electronics and other physical sciences.

Original languageEnglish
Title of host publicationNanostructures in Electronics and Photonics
Pages113-129
Number of pages17
ISBN (Electronic)9789814241120
StatePublished - 19 Apr 2016

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