Design, fabrication, and applications of large-area well-ordered dense-array three-dimensional nanostructures

Chang Hwan Choi; Chang Jin Kim

Design, fabrication, and applications of large-area well-ordered dense-array three-dimensional nanostructures

Chang Hwan Choi, Chang Jin Kim

Department of Mechanical Engineering

University of California at Los Angeles

Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review

Abstract

A highly effective fabrication process combining interference lithography with deep reactive ion etching is described. This simple technique makes it possible to build well-ordered dense-array of nanostructures with good control of pattern regularity and size over a large area. The unique three-dimensional structures possible with this process can have a variety of applications in electronics and other physical sciences.

Original language	English
Title of host publication	Nanostructures in Electronics and Photonics
Pages	113-129
Number of pages	17
ISBN (Electronic)	9789814241120
State	Published - 19 Apr 2016

Cite this

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title = "Design, fabrication, and applications of large-area well-ordered dense-array three-dimensional nanostructures",

abstract = "A highly effective fabrication process combining interference lithography with deep reactive ion etching is described. This simple technique makes it possible to build well-ordered dense-array of nanostructures with good control of pattern regularity and size over a large area. The unique three-dimensional structures possible with this process can have a variety of applications in electronics and other physical sciences.",

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AU - Kim, Chang Jin

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N2 - A highly effective fabrication process combining interference lithography with deep reactive ion etching is described. This simple technique makes it possible to build well-ordered dense-array of nanostructures with good control of pattern regularity and size over a large area. The unique three-dimensional structures possible with this process can have a variety of applications in electronics and other physical sciences.

AB - A highly effective fabrication process combining interference lithography with deep reactive ion etching is described. This simple technique makes it possible to build well-ordered dense-array of nanostructures with good control of pattern regularity and size over a large area. The unique three-dimensional structures possible with this process can have a variety of applications in electronics and other physical sciences.

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BT - Nanostructures in Electronics and Photonics

ER -

Design, fabrication, and applications of large-area well-ordered dense-array three-dimensional nanostructures

Abstract

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