Abstract
A highly effective fabrication process combining interference lithography with deep reactive ionetching is described. This simple technique makes it possible to build well-ordered dense-array of nanostructures with good control of pattern regularity and size over a large area. The unique three-dimensional structures possible with this process can have a variety of applications in electronics and other physical sciences.
Original language | English |
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Title of host publication | Nanostructures in Electronics and Photonics |
Pages | 113-129 |
Number of pages | 17 |
DOIs | |
State | Published - 1 Apr 2008 |