Effects of implantation temperature on the structure, composition and oxidation resistance of SiC

Zunde Yang, Honghua Du, Matthew Libera, Irwin L. Singer

Research output: Contribution to journalConference articlepeer-review

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Abstract

α-SiC crystals were implanted with aluminum to a high dose at room temperature or 800°C. Studies by transmission electron microscopy showed that SiC was amorphized by room temperature implantation but remained crystalline at 800°C. Crystalline aluminum carbide was formed and aluminum redistribution took place in SiC implanted at 800°C. Implanted crystals were oxidized in 1 atm flowing oxygen at 1300°C. Amorphization led to accelerated oxidation of SiC. The oxidation resistance of SiC implanted at 800°C was comparable to that of pure SiC. The oxidation layers formed on SiC implanted at both temperatures consisted of silica embedded with mullite precipitates. The phase formation during implantation and oxidation is consistent with thermodynamic predictions.

Original languageEnglish
Pages (from-to)281-286
Number of pages6
JournalMaterials Research Society Symposium Proceedings
Volume354
StatePublished - 1995
EventProceedings of the 1994 MRS Fall Meeting - Boston, MA, USA
Duration: 28 Nov 19942 Dec 1994

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