Abstract
Germanium-doped silica ridge waveguides for planar lightwave circuits were fabricated using colloidal suspensions. After consolidation at 1300 °C, fully dense micron-scale thick films were obtained. The refractive index of these films was tuned with germanium dopant up to 11.1 mol %. The propagation loss of a 3.1 mol % germanium-doped silica sample without an overcladding layer was 3.3±0.5 dBcm. Postannealing of the patterned waveguides at 1200 °C for 30 min was conducted in order to reflow waveguides, but it did not significantly smooth the sidewall roughness due to the high viscosity of the 3.1 mol % germanium-doped silica at that temperature.
Original language | English |
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Article number | 121114 |
Pages (from-to) | 1-3 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 87 |
Issue number | 12 |
DOIs | |
State | Published - 19 Sep 2005 |