Abstract
A pair of one-way passive microvalves is fabricated by using the p + etch-stop method. The two valves have a simple structure and are easy to fabricate. Each valve consists of several p + silicon diaphragms and is designed to open and close depending on the pressure difference. The fabrication process of the valves consists of a boron diffusion and simple anisotropic etch processes. According to the experimental results, the water flow rate is 1.6 ml min-1 at 4 kPa of forward pressure and -0.05 ml min-1 at 4 kPa of backward pressure.
| Original language | English |
|---|---|
| Pages (from-to) | 75-78 |
| Number of pages | 4 |
| Journal | Sensors and Actuators, A: Physical |
| Volume | 57 |
| Issue number | 1 |
| DOIs | |
| State | Published - Oct 1996 |
Keywords
- Etch-stop method; p + silicon film
- Passive bivalvular microvalves
- Static flow testing
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