Fabrication of polymeric and polymeric nano-composite MEMS structures

Daizong Li, Serdar Tumkor, Souran Manoochehri, Kishore Pochiraju

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This paper presents methodologies for rapid prototyping of complex and functional polymeric MEMS structures using lithography steps only. In order to overcome stiffness and strength limitations of the polymeric structures, reinforcing nanomaterials were added to enhance stiffness. A challenge in processing polymeric MEMS devices is achieving the release of the MEMS structure from the substrate. This paper presents several process sequences and photoresist combinations that produce freestanding polymeric MEMS structures. Negative photoresist (SU8) and positive photoresist (AZ4620) materials were used in spin coat, bake, exposure and selective development steps. This paper describes the experiments used for determining the optimal process parameters and the release performance. In addition, the paper also illustrates exposure control techniques that reduce process-induced defects such as heat- induced bubbles, degassing and overexposure.

Original languageEnglish
Title of host publicationProceedings of the ASME International Mechanical Engineering Congress and Exposition 2009, IMECE 2009
Pages309-313
Number of pages5
EditionPART A
DOIs
StatePublished - 2010
EventASME 2009 International Mechanical Engineering Congress and Exposition, IMECE2009 - Lake Buena Vista, FL, United States
Duration: 13 Nov 200919 Nov 2009

Publication series

NameASME International Mechanical Engineering Congress and Exposition, Proceedings
NumberPART A
Volume12

Conference

ConferenceASME 2009 International Mechanical Engineering Congress and Exposition, IMECE2009
Country/TerritoryUnited States
CityLake Buena Vista, FL
Period13/11/0919/11/09

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