High-temperature stability of amorphous Al2O3 deposited on Si and CeO2-stabilized ZrO2 by metalorganic chemical vapor deposition

J. D. Meyer, W. Y. Lee

Research output: Contribution to journalArticlepeer-review

Abstract

Aluminum acetylacetonate and water vapor were used to deposit an amorphous Al2O3 seal coating on Si and CeO2-stabilized ZrO2 (CSZ) produced by air plasma spray. The Al2O3 coating prepared at ∼500°C was ∼2.5μm thick, uniform, and non-porous. The crystallization and adhesion characteristics of the Al2O3 coating were examined by thermally annealing the Al2O3-coated Si and CSZ substrates in air. The amorphous coating crystallized to metastable Al2O3- phases within 20 hours at temperatures as low as 700°C. The coating on Si spalled upon annealing whereas the coating on CSZ did not spall, but microcracked extensively due to the significant volume shrinkage associated with crystallization.

Original languageEnglish
Pages (from-to)103-107
Number of pages5
JournalMaterials Research Society Symposium Proceedings
Volume555
StatePublished - 1999

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