Investigation of charging mechanisms in RF-MEMS capacitive switches with silicon nitride: The effect of material stoichiometry

G. Papaioannou, N. Tavassolian, M. Koutsoureli, E. Papandreou, J. Papapolymerou

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

7 Scopus citations

Abstract

The mechanisms responsible for the dielectric charging of RF MEMS capacitive switches with PECVD nitride are systematically investigated. The investigation is based on the shift of the minimum of capacitance-voltage characteristic with maximum bias in pull-down state, temperature and nitride stoichiometry. The contribution of current injection from trap assisted tunneling and Poole-Frenkel effect is investigated. The experimental results indicate that the charging arises from the formation of a defect band where charge transport occurs through a Poole-Frenkel like effect. The calculated activation energy shows direct relation to material stoichiometry hence the nitride band gap. The nitride deposited at a lower temperature is also less prone to dielectric charging.

Original languageEnglish
Title of host publicationIMS 2009 - 2009 IEEE MTT-S International Microwave Symposium Digest
Pages1653-1656
Number of pages4
DOIs
StatePublished - 2009
Event2009 IEEE MTT-S International Microwave Symposium, IMS 2009 - Boston, MA, United States
Duration: 7 Jun 200912 Jun 2009

Publication series

NameIEEE MTT-S International Microwave Symposium Digest
ISSN (Print)0149-645X

Conference

Conference2009 IEEE MTT-S International Microwave Symposium, IMS 2009
Country/TerritoryUnited States
CityBoston, MA
Period7/06/0912/06/09

Keywords

  • Dielectric materials
  • Micro-electro-mechanical devices
  • RF MEMS switches
  • Reliability

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