TY - JOUR
T1 - Large-area pattern transfer of metallic nanostructures on glass substrates via interference lithography
AU - Du, Ke
AU - Wathuthanthri, Ishan
AU - Mao, Weidong
AU - Xu, Wei
AU - Choi, Chang Hwan
PY - 2011/7/15
Y1 - 2011/7/15
N2 - In this paper, we report a simple and effective nanofabrication method for the pattern transfer of metallic nanostructures over a large surface area on a glass substrate. Photoresist (PR) nano-patterns, defined by laser interference lithography, are used as template structures where a metal film of controlled thickness is directly deposited and then transferred onto a glass substrate by the sacrificial etching of the PR inter-layer. The laser interference lithography, capable of creating periodic nano-patterns with good control of their dimensions and shapes over a relatively large area, allows the wafer-scale pattern transfer of metallic nanostructures in a very convenient way. By using the approach, we have successfully fabricated on a glass substrate uniform arrays of hole, grating, and pillar patterns of Ti, Al, and Au in varying pattern periodicities (200nm-1νm) over a surface area of up to several cm2 with little mechanical crack and delamination. Such robust metallic nanostructures defined well on a transparent glass substrate with large pattern coverage will lead to advanced scientific and engineering applications such as microfluidics and nanophotonics.
AB - In this paper, we report a simple and effective nanofabrication method for the pattern transfer of metallic nanostructures over a large surface area on a glass substrate. Photoresist (PR) nano-patterns, defined by laser interference lithography, are used as template structures where a metal film of controlled thickness is directly deposited and then transferred onto a glass substrate by the sacrificial etching of the PR inter-layer. The laser interference lithography, capable of creating periodic nano-patterns with good control of their dimensions and shapes over a relatively large area, allows the wafer-scale pattern transfer of metallic nanostructures in a very convenient way. By using the approach, we have successfully fabricated on a glass substrate uniform arrays of hole, grating, and pillar patterns of Ti, Al, and Au in varying pattern periodicities (200nm-1νm) over a surface area of up to several cm2 with little mechanical crack and delamination. Such robust metallic nanostructures defined well on a transparent glass substrate with large pattern coverage will lead to advanced scientific and engineering applications such as microfluidics and nanophotonics.
UR - http://www.scopus.com/inward/record.url?scp=79959247189&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=79959247189&partnerID=8YFLogxK
U2 - 10.1088/0957-4484/22/28/285306
DO - 10.1088/0957-4484/22/28/285306
M3 - Article
AN - SCOPUS:79959247189
SN - 0957-4484
VL - 22
JO - Nanotechnology
JF - Nanotechnology
IS - 28
M1 - 285306
ER -