Abstract
In this work, we report on an efficient approach to fabricating large-area and uniform planar arrays of highly ordered nanoporous gold nanowires. The approach consists in dealloying Au-Ag alloy nanowires in concentrated nitric acid. The Au-Ag alloy nanowires were obtained by thermal annealing at 800 °C for 2 h of Au/Ag stacked nanoribbons prepared by subsequent evaporation of silver and gold through a nanograted photoresist layer serving as a mask for a lift-off process. Laser interference lithography was employed for the nanopatterning of the photoresist layer to create the large-area nanostructured mask. The result shows that for a low Au-to-Ag ratio of 1, the nanowires tend to cracks during the dealloying due to the internal residual stress generated during the dealloying process, whereas the increase of the Au-to-Ag ratio to 3 can overcome the drawback and successfully leads to the obtainment of an array of highly ordered nanoporous gold nanowires. Nanoporous gold nanowires with such well-regulated organization on a wafer-scale planar substrate are of great significance in many applications including sensors and actuators.
Original language | English |
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Article number | 168 |
Journal | Micromachines |
Volume | 8 |
Issue number | 6 |
DOIs | |
State | Published - 2017 |
Keywords
- Dealloying
- Laser interference lithography
- Nanopatterning
- Nanoporous gold