Laser absorption spectroscopy: A sensitive gas phase processing monitor

Edward A. Whittaker; Chi Man Shum

doi:10.1117/12.951014

Laser absorption spectroscopy: A sensitive gas phase processing monitor

Edward A. Whittaker
, Chi Man Shum

Stevens Institute of Technology

Research output: Contribution to journal › Conference article › peer-review

Abstract

We present a summary of our efforts to develop a general purpose probe for plasma and other gas phase processing techniques based on laser absorption spectroscopy. This method offers several advantages for gas phase point monitoring, including line-of-sight optical access, small solid angle detection, absolute species concentration calibration and simple interpretation of spectra. Drawbacks to overcome include limited sensitivity due to laser technical noise and limited spectral coverage of high resolution tunable dye and diode lasers.

Original language	English
Pages (from-to)	43-49
Number of pages	7
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	1037
DOIs	https://doi.org/10.1117/12.951014
State	Published - 15 Mar 1989
Event	Monitoring and Control of Plasma-Enhanced Processing of Semiconductors 1988 - Santa Clara, United States Duration: 1 Nov 1988 → 3 Nov 1988

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title = "Laser absorption spectroscopy: A sensitive gas phase processing monitor",

abstract = "We present a summary of our efforts to develop a general purpose probe for plasma and other gas phase processing techniques based on laser absorption spectroscopy. This method offers several advantages for gas phase point monitoring, including line-of-sight optical access, small solid angle detection, absolute species concentration calibration and simple interpretation of spectra. Drawbacks to overcome include limited sensitivity due to laser technical noise and limited spectral coverage of high resolution tunable dye and diode lasers.",

author = "Whittaker, \{Edward A.\} and Shum, \{Chi Man\}",

note = "Publisher Copyright: {\textcopyright} 1989 SPIE. All rights reserved.; Monitoring and Control of Plasma-Enhanced Processing of Semiconductors 1988 ; Conference date: 01-11-1988 Through 03-11-1988",

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doi = "10.1117/12.951014",

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T2 - Monitoring and Control of Plasma-Enhanced Processing of Semiconductors 1988

AU - Whittaker, Edward A.

AU - Shum, Chi Man

PY - 1989/3/15

Y1 - 1989/3/15

N2 - We present a summary of our efforts to develop a general purpose probe for plasma and other gas phase processing techniques based on laser absorption spectroscopy. This method offers several advantages for gas phase point monitoring, including line-of-sight optical access, small solid angle detection, absolute species concentration calibration and simple interpretation of spectra. Drawbacks to overcome include limited sensitivity due to laser technical noise and limited spectral coverage of high resolution tunable dye and diode lasers.

AB - We present a summary of our efforts to develop a general purpose probe for plasma and other gas phase processing techniques based on laser absorption spectroscopy. This method offers several advantages for gas phase point monitoring, including line-of-sight optical access, small solid angle detection, absolute species concentration calibration and simple interpretation of spectra. Drawbacks to overcome include limited sensitivity due to laser technical noise and limited spectral coverage of high resolution tunable dye and diode lasers.

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U2 - 10.1117/12.951014

DO - 10.1117/12.951014

M3 - Conference article

AN - SCOPUS:85075498990

SN - 0277-786X

VL - 1037

SP - 43

EP - 49

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

Y2 - 1 November 1988 through 3 November 1988

ER -

Laser absorption spectroscopy: A sensitive gas phase processing monitor

Abstract

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