Abstract
BaSm2Ti4O12 (BST) film grown at room temperature was amorphous, while the film grown at 300 °C was also amorphous but contained a small amount of crystalline Sm2Ti2O7 (ST). The crystalline BST phase was formed when the film was grown at 700 °C and subjected to rapid thermal annealing (RTA) at 900 °C. On the other hand, the ST phase was formed in the film grown at 300 °C and subjected to RTA at 900 °C. A high capacitance density of 2.12 fF/μm2 and a low leakage current density of 1.15 fA/pF V were obtained from the 150 nm-thick BST film grown at 300 °C. Its capacitance density could conceivably be further increased by decreasing the thickness of the film. It had linear and quadratic coefficients of capacitance of -785 ppm/V and 5.8 ppm/V2 at 100 kHz, respectively. Its temperature coefficient of capacitance was also low, being approximately 255 ppm/°C at 100 kHz.
Original language | English |
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Pages (from-to) | 2849-2853 |
Number of pages | 5 |
Journal | Journal of the European Ceramic Society |
Volume | 27 |
Issue number | 8-9 SPEC. ISS. |
DOIs | |
State | Published - 2007 |
Keywords
- BaSmTiO
- Capacitors
- Electrical properties
- Films