Microstructure and dielectric properties of amorphous BaSm2Ti4O12 thin films for MIM capacitor

Young Hun Jeong, Jong Bong Lim, Jae Chul Kim, Sahn Nahm, Ho Jung Sun, Hwack Joo Lee

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

BaSm2Ti4O12 (BST) film grown at room temperature was amorphous, while the film grown at 300 °C was also amorphous but contained a small amount of crystalline Sm2Ti2O7 (ST). The crystalline BST phase was formed when the film was grown at 700 °C and subjected to rapid thermal annealing (RTA) at 900 °C. On the other hand, the ST phase was formed in the film grown at 300 °C and subjected to RTA at 900 °C. A high capacitance density of 2.12 fF/μm2 and a low leakage current density of 1.15 fA/pF V were obtained from the 150 nm-thick BST film grown at 300 °C. Its capacitance density could conceivably be further increased by decreasing the thickness of the film. It had linear and quadratic coefficients of capacitance of -785 ppm/V and 5.8 ppm/V2 at 100 kHz, respectively. Its temperature coefficient of capacitance was also low, being approximately 255 ppm/°C at 100 kHz.

Original languageEnglish
Pages (from-to)2849-2853
Number of pages5
JournalJournal of the European Ceramic Society
Volume27
Issue number8-9 SPEC. ISS.
DOIs
StatePublished - 2007

Keywords

  • BaSmTiO
  • Capacitors
  • Electrical properties
  • Films

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