Morphological Evolution of ZnO Thin Films Deposited by Reactive Sputtering

Eugenia Mirica; Glen Kowach; Paul Evans; Henry Du

doi:10.1021/cg025595j

Morphological Evolution of ZnO Thin Films Deposited by Reactive Sputtering

Eugenia Mirica, Glen Kowach, Paul Evans, Henry Du

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55 Scopus citations

Abstract

The morphological evolution of ZnO thin films deposited by magnetron sputtering has been investigated on two types of substrates, (111) textured Pt and (100) Si possessing a native oxide. The ZnO films are oriented with the c-axis [0001] normal to the substrate and possess varying degrees of crystallinity. The films have a columnar structure with column diameters in the range of 40-300 nm. As observed by field emission scanning electron microscopy (FESEM), transmission electron microscopy (TEM), and X-ray diffraction, the film microstructure is strongly dependent on substrate temperature during deposition in the range from near room temperature up to 700 °C and is also dependent on substrate type. A textured film of platinum promotes nucleation thereby improving the crystallinity and texture of sputtered ZnO films. A mechanism for morphological evolution of the films via surface diffusion is proposed based on atom mobilities.

Original language	English
Pages (from-to)	147-156
Number of pages	10
Journal	Crystal Growth and Design
Volume	4
Issue number	1
DOIs	https://doi.org/10.1021/cg025595j
State	Published - Jan 2004

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@article{616132de49c64b8a9536cd2cfbd94573,

title = "Morphological Evolution of ZnO Thin Films Deposited by Reactive Sputtering",

abstract = "The morphological evolution of ZnO thin films deposited by magnetron sputtering has been investigated on two types of substrates, (111) textured Pt and (100) Si possessing a native oxide. The ZnO films are oriented with the c-axis [0001] normal to the substrate and possess varying degrees of crystallinity. The films have a columnar structure with column diameters in the range of 40-300 nm. As observed by field emission scanning electron microscopy (FESEM), transmission electron microscopy (TEM), and X-ray diffraction, the film microstructure is strongly dependent on substrate temperature during deposition in the range from near room temperature up to 700 °C and is also dependent on substrate type. A textured film of platinum promotes nucleation thereby improving the crystallinity and texture of sputtered ZnO films. A mechanism for morphological evolution of the films via surface diffusion is proposed based on atom mobilities.",

author = "Eugenia Mirica and Glen Kowach and Paul Evans and Henry Du",

year = "2004",

month = jan,

doi = "10.1021/cg025595j",

language = "English",

volume = "4",

pages = "147--156",

number = "1",

}

TY - JOUR

T1 - Morphological Evolution of ZnO Thin Films Deposited by Reactive Sputtering

AU - Mirica, Eugenia

AU - Kowach, Glen

AU - Evans, Paul

AU - Du, Henry

PY - 2004/1

Y1 - 2004/1

N2 - The morphological evolution of ZnO thin films deposited by magnetron sputtering has been investigated on two types of substrates, (111) textured Pt and (100) Si possessing a native oxide. The ZnO films are oriented with the c-axis [0001] normal to the substrate and possess varying degrees of crystallinity. The films have a columnar structure with column diameters in the range of 40-300 nm. As observed by field emission scanning electron microscopy (FESEM), transmission electron microscopy (TEM), and X-ray diffraction, the film microstructure is strongly dependent on substrate temperature during deposition in the range from near room temperature up to 700 °C and is also dependent on substrate type. A textured film of platinum promotes nucleation thereby improving the crystallinity and texture of sputtered ZnO films. A mechanism for morphological evolution of the films via surface diffusion is proposed based on atom mobilities.

AB - The morphological evolution of ZnO thin films deposited by magnetron sputtering has been investigated on two types of substrates, (111) textured Pt and (100) Si possessing a native oxide. The ZnO films are oriented with the c-axis [0001] normal to the substrate and possess varying degrees of crystallinity. The films have a columnar structure with column diameters in the range of 40-300 nm. As observed by field emission scanning electron microscopy (FESEM), transmission electron microscopy (TEM), and X-ray diffraction, the film microstructure is strongly dependent on substrate temperature during deposition in the range from near room temperature up to 700 °C and is also dependent on substrate type. A textured film of platinum promotes nucleation thereby improving the crystallinity and texture of sputtered ZnO films. A mechanism for morphological evolution of the films via surface diffusion is proposed based on atom mobilities.

UR - https://www.scopus.com/pages/publications/1642538243

UR - https://www.scopus.com/inward/citedby.url?scp=1642538243&partnerID=8YFLogxK

U2 - 10.1021/cg025595j

DO - 10.1021/cg025595j

M3 - Article

AN - SCOPUS:1642538243

SN - 1528-7483

VL - 4

SP - 147

EP - 156

JO - Crystal Growth and Design

JF - Crystal Growth and Design

IS - 1

ER -

Morphological Evolution of ZnO Thin Films Deposited by Reactive Sputtering

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