Nanoscale graphene lithography using an atomic force microscope

K. Kumar, E. H. Yang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this work, we have systematically studied local oxidation lithography parameters using an Atomic Force Microscope (AFM) on graphene material. Graphene has recently been shown to have exceptional electrical properties which give it a niche in emerging nanoelectronics applications requiring quantum structures. The desktop AFM nanolithography technique has lately been shown [1-3] to fabricate graphitic nanodevices on the order of tens of nanometers. By applying an appropriate electric field between AFM tip and substrate in humid atmosphere, oxidation of the substrate occurs. Depending on such process parameters as applied voltage, tip speed, water meniscus length and humidity, the oxidation of the graphitic material enables the formation of insulating trenches to make various nanostructures. Using this optimized technique, we have oxidized nanometer-sized features on single and few layer graphene and graphite.

Original languageEnglish
Title of host publicationNanotechnology 2010
Subtitle of host publicationElectronics, Devices, Fabrication, MEMS, Fluidics and Computational - Technical Proceedings of the 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010
Pages199-201
Number of pages3
StatePublished - 2010
EventNanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010 - Anaheim, CA, United States
Duration: 21 Jun 201024 Jun 2010

Publication series

NameNanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - Technical Proceedings of the 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010
Volume2

Conference

ConferenceNanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010
Country/TerritoryUnited States
CityAnaheim, CA
Period21/06/1024/06/10

Keywords

  • Atomic Force Microscope
  • Graphene
  • Graphite
  • Lithography

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