TY - GEN
T1 - Nanoscale graphene lithography using an atomic force microscope
AU - Kumar, K.
AU - Yang, E. H.
PY - 2010
Y1 - 2010
N2 - In this work, we have systematically studied local oxidation lithography parameters using an Atomic Force Microscope (AFM) on graphene material. Graphene has recently been shown to have exceptional electrical properties which give it a niche in emerging nanoelectronics applications requiring quantum structures. The desktop AFM nanolithography technique has lately been shown [1-3] to fabricate graphitic nanodevices on the order of tens of nanometers. By applying an appropriate electric field between AFM tip and substrate in humid atmosphere, oxidation of the substrate occurs. Depending on such process parameters as applied voltage, tip speed, water meniscus length and humidity, the oxidation of the graphitic material enables the formation of insulating trenches to make various nanostructures. Using this optimized technique, we have oxidized nanometer-sized features on single and few layer graphene and graphite.
AB - In this work, we have systematically studied local oxidation lithography parameters using an Atomic Force Microscope (AFM) on graphene material. Graphene has recently been shown to have exceptional electrical properties which give it a niche in emerging nanoelectronics applications requiring quantum structures. The desktop AFM nanolithography technique has lately been shown [1-3] to fabricate graphitic nanodevices on the order of tens of nanometers. By applying an appropriate electric field between AFM tip and substrate in humid atmosphere, oxidation of the substrate occurs. Depending on such process parameters as applied voltage, tip speed, water meniscus length and humidity, the oxidation of the graphitic material enables the formation of insulating trenches to make various nanostructures. Using this optimized technique, we have oxidized nanometer-sized features on single and few layer graphene and graphite.
KW - Atomic Force Microscope
KW - Graphene
KW - Graphite
KW - Lithography
UR - http://www.scopus.com/inward/record.url?scp=78049436942&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=78049436942&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:78049436942
SN - 9781439834022
T3 - Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - Technical Proceedings of the 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010
SP - 199
EP - 201
BT - Nanotechnology 2010
T2 - Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010
Y2 - 21 June 2010 through 24 June 2010
ER -