Nanoscale hardness and microfriction of titanium nitride films deposited from the reaction of tetrakis (dimethylamino) titanium with ammonia

Y. W. Bae; W. Y. Lee; T. M. Besmann; P. J. Blau

doi:10.1063/1.113313

Nanoscale hardness and microfriction of titanium nitride films deposited from the reaction of tetrakis (dimethylamino) titanium with ammonia

Y. W. Bae
, W. Y. Lee
, T. M. Besmann
, P. J. Blau

Oak Ridge National Laboratory

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

Abstract

Nanocrystalline titanium nitride films with very low carbon and oxygen content were deposited on single-crystal silicon substrates from the reaction of tetrakis (dimethylamino) titanium,Ti[(CH₃)₂N]₄, with ammonia at 633 K and a pressure of 665 Pa. The film consisted of ∼10 nm grains. The hardness of the film, measured by nanoindentation, was 12.7±0.6 GPa. The average kinetic friction coefficient, against type 440C stainless steel, was determined using a friction microprobe to be 0.43.

Original language	English
Pages (from-to)	1895
Number of pages	1
Journal	Applied Physics Letters
DOIs	https://doi.org/10.1063/1.113313
State	Published - 1995

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title = "Nanoscale hardness and microfriction of titanium nitride films deposited from the reaction of tetrakis (dimethylamino) titanium with ammonia",

abstract = "Nanocrystalline titanium nitride films with very low carbon and oxygen content were deposited on single-crystal silicon substrates from the reaction of tetrakis (dimethylamino) titanium,Ti[(CH3)2N]4, with ammonia at 633 K and a pressure of 665 Pa. The film consisted of ∼10 nm grains. The hardness of the film, measured by nanoindentation, was 12.7±0.6 GPa. The average kinetic friction coefficient, against type 440C stainless steel, was determined using a friction microprobe to be 0.43.",

author = "Bae, \{Y. W.\} and Lee, \{W. Y.\} and Besmann, \{T. M.\} and Blau, \{P. J.\}",

year = "1995",

doi = "10.1063/1.113313",

language = "English",

pages = "1895",

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TY - JOUR

T1 - Nanoscale hardness and microfriction of titanium nitride films deposited from the reaction of tetrakis (dimethylamino) titanium with ammonia

AU - Bae, Y. W.

AU - Lee, W. Y.

AU - Besmann, T. M.

AU - Blau, P. J.

PY - 1995

Y1 - 1995

N2 - Nanocrystalline titanium nitride films with very low carbon and oxygen content were deposited on single-crystal silicon substrates from the reaction of tetrakis (dimethylamino) titanium,Ti[(CH3)2N]4, with ammonia at 633 K and a pressure of 665 Pa. The film consisted of ∼10 nm grains. The hardness of the film, measured by nanoindentation, was 12.7±0.6 GPa. The average kinetic friction coefficient, against type 440C stainless steel, was determined using a friction microprobe to be 0.43.

AB - Nanocrystalline titanium nitride films with very low carbon and oxygen content were deposited on single-crystal silicon substrates from the reaction of tetrakis (dimethylamino) titanium,Ti[(CH3)2N]4, with ammonia at 633 K and a pressure of 665 Pa. The film consisted of ∼10 nm grains. The hardness of the film, measured by nanoindentation, was 12.7±0.6 GPa. The average kinetic friction coefficient, against type 440C stainless steel, was determined using a friction microprobe to be 0.43.

UR - https://www.scopus.com/pages/publications/36449004133

UR - https://www.scopus.com/pages/publications/36449004133#tab=citedBy

U2 - 10.1063/1.113313

DO - 10.1063/1.113313

M3 - Article

AN - SCOPUS:36449004133

SN - 0003-6951

SP - 1895

JO - Applied Physics Letters

JF - Applied Physics Letters

ER -

Nanoscale hardness and microfriction of titanium nitride films deposited from the reaction of tetrakis (dimethylamino) titanium with ammonia

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