New technique for quantitative determination of the stress profile along the depth of p⁺ silicon films

Engineering

• Residual Stress 100%
• Film Silicon 100%
• Surfaces 50%
• Determines 50%
• Applications 50%
• Deflection 50%
• Illustrates 50%
• Beam Structure 50%
• Boron 50%
• Rotating Beam 50%
• Tensile Stress σ 50%

Physics

• Region 100%
• Utilization 50%
• Deflection 50%
• Rotation 50%
• Ultimate Tensile Strength 50%
• Calculation 50%
• Silicon 50%

Material Science

• Silicon 100%
• Surface 66%
• Film 66%