Real-time in situ detection of SF6 in a plasma reactor

H. C. Sun; E. A. Whittaker

doi:10.1063/1.109826

Real-time in situ detection of SF₆ in a plasma reactor

H. C. Sun, E. A. Whittaker

Stevens Institute of Technology

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

We report on the real-time in situ detection of SF₆ in a plasma etching reactor with μTorr sensitivity using a tunable diode laser absorption spectrometer. The spectrometer employs combined wavelength and frequency modulation of the laser diode, an approach which allows for sensitive, interference fringe-free detection of the SF₆. The dual modulation scheme also provides a feedback signal which enables the laser to be frequency locked to the absorption line.

Original language	English
Pages (from-to)	1035-1037
Number of pages	3
Journal	Applied Physics Letters
Volume	63
Issue number	8
DOIs	https://doi.org/10.1063/1.109826
State	Published - 1993

Access to Document

10.1063/1.109826

Cite this

@article{4c905360d6a84c4588c9bc7ea2db2d7c,

title = "Real-time in situ detection of SF6 in a plasma reactor",

abstract = "We report on the real-time in situ detection of SF6 in a plasma etching reactor with μTorr sensitivity using a tunable diode laser absorption spectrometer. The spectrometer employs combined wavelength and frequency modulation of the laser diode, an approach which allows for sensitive, interference fringe-free detection of the SF6. The dual modulation scheme also provides a feedback signal which enables the laser to be frequency locked to the absorption line.",

author = "Sun, \{H. C.\} and Whittaker, \{E. A.\}",

year = "1993",

doi = "10.1063/1.109826",

language = "English",

volume = "63",

pages = "1035--1037",

number = "8",

}

TY - JOUR

T1 - Real-time in situ detection of SF6 in a plasma reactor

AU - Sun, H. C.

AU - Whittaker, E. A.

PY - 1993

Y1 - 1993

N2 - We report on the real-time in situ detection of SF6 in a plasma etching reactor with μTorr sensitivity using a tunable diode laser absorption spectrometer. The spectrometer employs combined wavelength and frequency modulation of the laser diode, an approach which allows for sensitive, interference fringe-free detection of the SF6. The dual modulation scheme also provides a feedback signal which enables the laser to be frequency locked to the absorption line.

AB - We report on the real-time in situ detection of SF6 in a plasma etching reactor with μTorr sensitivity using a tunable diode laser absorption spectrometer. The spectrometer employs combined wavelength and frequency modulation of the laser diode, an approach which allows for sensitive, interference fringe-free detection of the SF6. The dual modulation scheme also provides a feedback signal which enables the laser to be frequency locked to the absorption line.

UR - https://www.scopus.com/pages/publications/0141855633

UR - https://www.scopus.com/inward/citedby.url?scp=0141855633&partnerID=8YFLogxK

U2 - 10.1063/1.109826

DO - 10.1063/1.109826

M3 - Article

AN - SCOPUS:0141855633

SN - 0003-6951

VL - 63

SP - 1035

EP - 1037

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 8

ER -

Real-time in situ detection of SF₆ in a plasma reactor

Abstract

Access to Document

Other files and links

Fingerprint

Cite this