TY - GEN
T1 - RELATIONSHIP OF STRUCTURE TO PROPERTIES IN ELECTRODEPOSITED FILMS.
AU - Sheppard, Keith
AU - Weil, Rolf
PY - 1985
Y1 - 1985
N2 - The recent development of a more systematic, scientific basis for knowledge in electrodeposition technology is discussed, focussing on the influence of microstructure on deposit properties. Internal stresses, tensile strength, ductility, preferred orientation and the ability to electrodeposit amorphous materials are considered. In particular the unique influence on these properties of small quantities of chemical additives is discussed. The application of current modulation techniques during electrodeposition is described as an alternative means of controlling structure and properties.
AB - The recent development of a more systematic, scientific basis for knowledge in electrodeposition technology is discussed, focussing on the influence of microstructure on deposit properties. Internal stresses, tensile strength, ductility, preferred orientation and the ability to electrodeposit amorphous materials are considered. In particular the unique influence on these properties of small quantities of chemical additives is discussed. The application of current modulation techniques during electrodeposition is described as an alternative means of controlling structure and properties.
UR - http://www.scopus.com/inward/record.url?scp=0022192286&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0022192286&partnerID=8YFLogxK
U2 - 10.1557/proc-47-127
DO - 10.1557/proc-47-127
M3 - Conference contribution
AN - SCOPUS:0022192286
SN - 093183712X
SN - 9780931837128
T3 - Materials Research Society Symposia Proceedings
SP - 127
EP - 134
BT - Materials Research Society Symposia Proceedings
ER -