Remediation of organic and inorganic arsenic contaminated groundwater using a nanocrystalline TiO 2-based adsorbent

Chuanyong Jing, Xiaoguang Meng, Edwin Calvache, Guibin Jiang

Research output: Contribution to journalArticlepeer-review

65 Scopus citations

Abstract

A nanocrystalline TiO 2-based adsorbent was evaluated for the simultaneous removal of As(V), As(III), monomethylarsonic acid (MMA), and dimethylarsinic acid (DMA) in contaminated groundwater. Batch experimental results show that As adsorption followed pseudo-second order rate kinetics. The competitive adsorption was described with the charge distribution multi-site surface complexation model (CD-MUSIC). The groundwater containing an average of 329 μg L -1 As(III), 246 μg L -1 As(V), 151 μg L -1 MMA, and 202 μg L -1 DMA was continuously passed through a TiO 2 filter at an empty bed contact time of 6 min for 4 months. Approximately 11 000, 14 000, and 9900 bed volumes of water had been treated before the As(III), As(V), and MMA concentration in the effluent increased to 10 μg L -1. However, very little DMA was removed. The EXAFS results demonstrate the existence of a bidentate binuclear As(V) surface complex on spent adsorbent, indicating the oxidation of adsorbed As(III).

Original languageEnglish
Pages (from-to)2514-2519
Number of pages6
JournalEnvironmental Pollution
Volume157
Issue number8-9
DOIs
StatePublished - Aug 2009

Keywords

  • Adsorptive filtration
  • Charge distribution multi-site surface complexation model
  • EXAFS
  • Inorganic arsenic
  • Organic arsenic
  • TiO

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