Simultaneous Chemical Vapor Deposition of Boron Nitride and Aluminum Nitride

Woo Y. Lee, W. J. Lackey, P. K. Agrawal, Garth B. Freeman

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

Two chemically different phases, hexagonal BN and AIN, were simultaneously produced by chemical vapor deposition (CVD) using an impinging jet reactor and the BCl3─AlCl3─NH3─Ar reagent system. The microstructure of the BN + AIN composite coatings was strongly dependent on temperature, pressure, and BCl3 and AlCl3 concentrations. The growth characteristics of BN and AIN in the codeposition system were similar to those expected from the single‐phase deposition processes (i.e., BN‐CVD and AIN‐CVD), except the growth of AIN whiskers was accentuated, and competition between BN and AIN deposition in the composites was suspected to be the cause of less‐crystalline deposits. In both BN + AIN‐CVD and AIN‐CVD, the growth of AIN whiskers became more apparent with increasing pressure or temperature. The codeposition behavior observed experimentally was compared with thermodynamic predictions.

Original languageEnglish
Pages (from-to)2649-2658
Number of pages10
JournalJournal of the American Ceramic Society
Volume74
Issue number10
DOIs
StatePublished - Oct 1991

Keywords

  • aluminum nitride
  • boron nitride
  • chemical vapor deposition
  • composites
  • microscopy

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