Abstract
Thin films of titanium nitride were chemical vapor deposited on (100)-oriented single-crystal silicon substrates from tetrakis (dimethylamino) titanium, Ti((CH3)2N)4, and ammonia gas mixtures in a cold-wall reactor at 623 K and 655 Pa. The films were characterized by Auger electron spectroscopy, X-ray diffraction, and transmission electron spectroscopy. The nano-scale hardness of the film, measured by nanoindentation, was 12.7±0.6 GPa. The average kinetic friction coefficient against unlubricated, type-440C stainless steel was determined using a computer-controlled friction microprobe to be approx.0.43.
| Original language | English |
|---|---|
| Pages (from-to) | 245-250 |
| Number of pages | 6 |
| Journal | Materials Research Society Symposium Proceedings |
| Volume | 363 |
| State | Published - 1995 |
| Event | Proceedings of the 1994 MRS Fall Meeting - Boston, MA, USA Duration: 28 Nov 1994 → 30 Nov 1994 |
Fingerprint
Dive into the research topics of 'Synthesis and selected micro-mechanical properties of titanium nitride thin films by the pyrolysis of tetrakis titanium in ammonia'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver