The effect of nonlinear ion transport on the rate of laser-induced electrochemical etching of semiconductors

H. Grebel; B. Iskandar; K. G. Sheppard

doi:10.1063/1.345571

The effect of nonlinear ion transport on the rate of laser-induced electrochemical etching of semiconductors

H. Grebel, B. Iskandar, K. G. Sheppard

New Jersey Institute of Technology

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

Based on a nonlinear coupling between the etchant species and the photo-induced carriers during photoelectrochemical etching of semiconductor surfaces, we propose that an optimum exists for the reaction rate as a function of electrolyte concentration.

Original language	English
Pages (from-to)	1947-1949
Number of pages	3
Journal	Journal of Applied Physics
Volume	67
Issue number	4
DOIs	https://doi.org/10.1063/1.345571
State	Published - 1990

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title = "The effect of nonlinear ion transport on the rate of laser-induced electrochemical etching of semiconductors",

abstract = "Based on a nonlinear coupling between the etchant species and the photo-induced carriers during photoelectrochemical etching of semiconductor surfaces, we propose that an optimum exists for the reaction rate as a function of electrolyte concentration.",

author = "H. Grebel and B. Iskandar and Sheppard, \{K. G.\}",

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AU - Grebel, H.

AU - Iskandar, B.

AU - Sheppard, K. G.

PY - 1990

Y1 - 1990

N2 - Based on a nonlinear coupling between the etchant species and the photo-induced carriers during photoelectrochemical etching of semiconductor surfaces, we propose that an optimum exists for the reaction rate as a function of electrolyte concentration.

AB - Based on a nonlinear coupling between the etchant species and the photo-induced carriers during photoelectrochemical etching of semiconductor surfaces, we propose that an optimum exists for the reaction rate as a function of electrolyte concentration.

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VL - 67

SP - 1947

EP - 1949

JO - Journal of Applied Physics

JF - Journal of Applied Physics

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ER -

The effect of nonlinear ion transport on the rate of laser-induced electrochemical etching of semiconductors

Abstract

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