Abstract
Transparent conductive oxides (TCOs) have emerged as alternative plasmonic materials in recent years to replace noble metals. The advantages of TCOs include CMOS compatibility, tunability of optical and structural properties, and reduced losses. In this work, we demonstrate how post-deposition annealing of indium tin oxide (ITO) films in oxygen atmosphere allows for tuning their optical dispersion properties to the mid-infrared spectral range while simultaneously reducing their absorption losses. In particular, we show a materials strategy that extends the epsilon-near-zero (ENZ) point of ITO from the nearinfrared to the mid-infrared range. This is demonstrated by fabricating periodic arrays of ITO discs of varying diameters and characterizing their plasmonic resonances in the mid-infrared range from λ = 5 to 10 μm. The developed ITO plasmonic structures pave the way to the development of novel infrared active devices for sensing and spectroscopy on a siliconcompatible platform.
| Original language | English |
|---|---|
| Pages (from-to) | 2727-2739 |
| Number of pages | 13 |
| Journal | Optical Materials Express |
| Volume | 7 |
| Issue number | 8 |
| DOIs | |
| State | Published - 2017 |
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