Tunable lloyd-mirror interferometer for large-area nanopatterning

Wathuthanthri Ishan, Chang Hwan Choi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This paper reports on a new Lloyd-mirror interference lithography system whose mirror angle is variable with respect to the substrate. We demonstrate that this tunable Lloyd-mirror interferometer significantly increases the nanopatterning area with greater controllability compared to a conventional fixed- angle system for pattern periodicity over 500 nm. The new configuration capable of the independent control of mirror angle will enhance the advantages of Lloyd-mirror interferometer for large-area nanopatterning with more flexibility.

Original languageEnglish
Title of host publicationProceedings of the ASME International Mechanical Engineering Congress and Exposition 2009, IMECE 2009
Pages433-438
Number of pages6
EditionPART A
DOIs
StatePublished - 2010
EventASME 2009 International Mechanical Engineering Congress and Exposition, IMECE2009 - Lake Buena Vista, FL, United States
Duration: 13 Nov 200919 Nov 2009

Publication series

NameASME International Mechanical Engineering Congress and Exposition, Proceedings
NumberPART A
Volume12

Conference

ConferenceASME 2009 International Mechanical Engineering Congress and Exposition, IMECE2009
Country/TerritoryUnited States
CityLake Buena Vista, FL
Period13/11/0919/11/09

Keywords

  • Interference lithography
  • Nanopatterning.

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