TY - GEN
T1 - Tunable lloyd-mirror interferometer for large-area nanopatterning
AU - Ishan, Wathuthanthri
AU - Choi, Chang Hwan
PY - 2010
Y1 - 2010
N2 - This paper reports on a new Lloyd-mirror interference lithography system whose mirror angle is variable with respect to the substrate. We demonstrate that this tunable Lloyd-mirror interferometer significantly increases the nanopatterning area with greater controllability compared to a conventional fixed- angle system for pattern periodicity over 500 nm. The new configuration capable of the independent control of mirror angle will enhance the advantages of Lloyd-mirror interferometer for large-area nanopatterning with more flexibility.
AB - This paper reports on a new Lloyd-mirror interference lithography system whose mirror angle is variable with respect to the substrate. We demonstrate that this tunable Lloyd-mirror interferometer significantly increases the nanopatterning area with greater controllability compared to a conventional fixed- angle system for pattern periodicity over 500 nm. The new configuration capable of the independent control of mirror angle will enhance the advantages of Lloyd-mirror interferometer for large-area nanopatterning with more flexibility.
KW - Interference lithography
KW - Nanopatterning.
UR - http://www.scopus.com/inward/record.url?scp=77954283491&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=77954283491&partnerID=8YFLogxK
U2 - 10.1115/IMECE2009-10895
DO - 10.1115/IMECE2009-10895
M3 - Conference contribution
AN - SCOPUS:77954283491
SN - 9780791843857
T3 - ASME International Mechanical Engineering Congress and Exposition, Proceedings
SP - 433
EP - 438
BT - Proceedings of the ASME International Mechanical Engineering Congress and Exposition 2009, IMECE 2009
T2 - ASME 2009 International Mechanical Engineering Congress and Exposition, IMECE2009
Y2 - 13 November 2009 through 19 November 2009
ER -