@inproceedings{a1a346620c2d4b5fb77a4e4eade8f5f5,
title = "Tunable two-mirror laser interference lithography system for large-area nano-patterning",
abstract = "A novel laser interference lithography system with enhanced tunablility in pattern periodicity and coverage has been designed and tested for large-area nano-patterning in a wide range of a pattern frequency. The tunable feature has been achieved by using two rotational mirrors on expanded beam paths at specific angles for a designed period. With a 325 nm laser wavelength, uniform resist nano-patterns of 250, 500, and 750 nm have been experimentally demonstrated on a 4-inch silicon substrate. This new interferometer configuration offers a convenient and robust way to prepare large-area nanostructures with superior tunability in pattern periods.",
keywords = "Interference lithography, Large-area, Nanofabrication, Tunable periodicity",
author = "Weidong Mao and Ishan Wathuthanthri and Choi, {Chang Hwan}",
year = "2011",
doi = "10.1117/12.879576",
language = "English",
isbn = "9780819485298",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Alternative Lithographic Technologies III",
note = "Alternative Lithographic Technologies III ; Conference date: 01-03-2011 Through 03-03-2011",
}