Tunable two-mirror laser interference lithography system for large-area nano-patterning

Weidong Mao, Ishan Wathuthanthri, Chang Hwan Choi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

A novel laser interference lithography system with enhanced tunablility in pattern periodicity and coverage has been designed and tested for large-area nano-patterning in a wide range of a pattern frequency. The tunable feature has been achieved by using two rotational mirrors on expanded beam paths at specific angles for a designed period. With a 325 nm laser wavelength, uniform resist nano-patterns of 250, 500, and 750 nm have been experimentally demonstrated on a 4-inch silicon substrate. This new interferometer configuration offers a convenient and robust way to prepare large-area nanostructures with superior tunability in pattern periods.

Original languageEnglish
Title of host publicationAlternative Lithographic Technologies III
DOIs
StatePublished - 2011
EventAlternative Lithographic Technologies III - San Jose, CA, United States
Duration: 1 Mar 20113 Mar 2011

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7970
ISSN (Print)0277-786X

Conference

ConferenceAlternative Lithographic Technologies III
Country/TerritoryUnited States
CitySan Jose, CA
Period1/03/113/03/11

Keywords

  • Interference lithography
  • Large-area
  • Nanofabrication
  • Tunable periodicity

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