Two degrees-of-freedom Lloyd-mirror interferometer for superior pattern coverage area

Ishan Wathuthanthri, Weidong Mao, Chang Hwan Choi

Research output: Contribution to journalArticlepeer-review

49 Scopus citations

Abstract

In this study, we have developed a tunable Lloyd-mirror interferometer with two degrees of freedom, in contrast to a traditional system with one degree of freedom. This new Lloyd-mirror interferometer allows an angular rotation of the mirror independently from that of a sample stage, resulting in an increased pattern coverage area with tunable pattern periodicity. Both theoretical and experimental results verify that the tunable characteristic of the modified configuration enhances the nanopatterning capabilities of the Lloyd-mirror interference lithography system especially in achieving greater pattern coverage area for larger pattern periodicities.

Original languageEnglish
Pages (from-to)1593-1595
Number of pages3
JournalOptics Letters
Volume36
Issue number9
DOIs
StatePublished - 1 May 2011

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